Invention Grant
US08041104B2 Pattern matching apparatus and scanning electron microscope using the same
有权
图案匹配装置和扫描电子显微镜使用相同
- Patent Title: Pattern matching apparatus and scanning electron microscope using the same
- Patent Title (中): 图案匹配装置和扫描电子显微镜使用相同
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Application No.: US11207936Application Date: 2005-08-22
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Publication No.: US08041104B2Publication Date: 2011-10-18
- Inventor: Yasutaka Toyoda , Mitsuji Ikeda , Atsushi Takane
- Applicant: Yasutaka Toyoda , Mitsuji Ikeda , Atsushi Takane
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2004-244555 20040825
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
A pattern matching apparatus comprising: means for storing photographed image data of a semiconductor device; means for storing CAD data of said semiconductor device; an information input means for inputting information on the white band width contained in said image data; a pattern extracting means for extracting a pattern on the semiconductor device from said image data by using the white band width information; and a matching means for matching said pattern with the CAD data.
Public/Granted literature
- US20060045326A1 Pattern matching apparatus and scanning electron microscope using the same Public/Granted day:2006-03-02
Information query
