Invention Grant
- Patent Title: Gas ion source with high mechanical stability
- Patent Title (中): 气体离子源具有较高的机械稳定性
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Application No.: US12199574Application Date: 2008-08-27
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Publication No.: US08044370B2Publication Date: 2011-10-25
- Inventor: Dieter Winkler , Thomas Jasinski
- Applicant: Dieter Winkler , Thomas Jasinski
- Applicant Address: DE Heimstetten
- Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Current Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Current Assignee Address: DE Heimstetten
- Agency: Patterson & Sheridan, L.L.P.
- Priority: EP07016766 20070827
- Main IPC: H01T23/00
- IPC: H01T23/00

Abstract:
A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.
Public/Granted literature
- US20090057566A1 GAS ION SOURCE WITH HIGH MECHANICAL STABILITY Public/Granted day:2009-03-05
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