Invention Grant
- Patent Title: Light-emitting device and method for manufacturing the same
- Patent Title (中): 发光装置及其制造方法
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Application No.: US12601794Application Date: 2008-03-26
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Publication No.: US08044382B2Publication Date: 2011-10-25
- Inventor: Shin Yokoyama , Yoshiteru Amemiya
- Applicant: Shin Yokoyama , Yoshiteru Amemiya
- Applicant Address: JP Hiroshima
- Assignee: Hiroshima University
- Current Assignee: Hiroshima University
- Current Assignee Address: JP Hiroshima
- Agency: Foley & Lardner LLP
- International Application: PCT/JP2008/000744 WO 20080326
- International Announcement: WO2009/118784 WO 20091001
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/0328 ; H01L31/0336 ; H01L31/072 ; H01L31/109 ; H01L27/15 ; H01L29/26 ; H01L31/12 ; H01L33/00 ; H01L21/331 ; H01L21/00

Abstract:
A light-emitting device includes an n-type silicon thin film (2), a silicon thin film (3), and a p-type silicon thin film (4). The silicon thin film (3) is formed on the n-type silicon thin film (2) and the p-type silicon thin film (4) is formed on the silicon thin film (3). The n-type silicon thin film (2), the silicon thin film (3), and the p-type silicon thin film (4) form a pin junction. The n-type silicon thin film (2) includes a plurality of quantum dots (21) composed of n-type Si. The silicon thin film (3) includes a plurality of quantum dots (31) composed of p-type Si. The p-type silicon thin film (4) includes a plurality of quantum dots (41) composed of p-type Si. Electrons are injected from the n-type silicon thin film (2) side and holes are injected from the p-type silicon thin film (4) side, whereby light is emitted at a silicon nitride film (3).
Public/Granted literature
- US20100176370A1 LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-07-15
Information query
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