Invention Grant
- Patent Title: Wide range radiation detector and manufacturing method
- Patent Title (中): 宽范围辐射探测器及制造方法
-
Application No.: US11454522Application Date: 2006-06-16
-
Publication No.: US08044476B2Publication Date: 2011-10-25
- Inventor: Yoshinori Hatanaka , Toru Aoki
- Applicant: Yoshinori Hatanaka , Toru Aoki
- Applicant Address: JP
- Assignee: National University Corporation Shizuoka University
- Current Assignee: National University Corporation Shizuoka University
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2003-418086 20031216; JP2003-433694 20031226
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
A radiation detector comprising a II-VI compound semiconductor substrate that absorbs radiation having a first energy, a II-VI compound semiconductor layer of a first conductivity type provided on a main surface of the II-VI compound semiconductor substrate, a metal layer containing at least one of a group III element and a group V element provided on the II-VI compound semiconductor layer, a IV semiconductor layer having a second conductivity type opposite to the first conductivity type provided on the metal layer, and a IV semiconductor substrate that absorbs radiation having a second energy different from the first energy provided on the IV semiconductor layer.
Public/Granted literature
- US20070176200A1 Wide range radiation detector and manufacturing method Public/Granted day:2007-08-02
Information query
IPC分类: