Invention Grant
- Patent Title: Bottom anode Schottky diode structure
- Patent Title (中): 底部阳极肖特基二极管结构
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Application No.: US12653345Application Date: 2009-12-11
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Publication No.: US08044486B2Publication Date: 2011-10-25
- Inventor: François Hébert
- Applicant: François Hébert
- Applicant Address: US CA Sunnyvale
- Assignee: Alpha & Omega Semiconductor, Inc.
- Current Assignee: Alpha & Omega Semiconductor, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agent Bo-In Lin
- Main IPC: H01L27/095
- IPC: H01L27/095 ; H01L29/93 ; H01L29/861 ; H01L31/107

Abstract:
This invention discloses a bottom-anode Schottky (BAS) diode that includes an anode electrode disposed on a bottom surface of a semiconductor substrate. The bottom-anode Schottky diode further includes a sinker dopant region disposed at a depth in the semiconductor substrate extending substantially to the anode electrode disposed on the bottom surface of the semiconductor and the sinker dopant region covered by a buried Schottky barrier metal functioning as a Schottky anode. The BAS diode further includes a lateral cathode region extended laterally from a cathode electrode near a top surface of the semiconductor substrate opposite the Schottky barrier metal wherein the lateral cathode region doped with an opposite dopant from the sinker dopant region and interfacing the sinker dopant region whereby a current path is formed from the cathode electrode to the anode electrode through the lateral cathode region and the sinker dopant region in applying a forward bias voltage and the sinker dopant region depleting the cathode region in applying a reverse bias voltage for blocking a leakage current.
Public/Granted literature
- US20100133644A1 Bottom anode Schottky diode structure and method Public/Granted day:2010-06-03
Information query
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