Invention Grant
- Patent Title: System for monitoring foreign particles, process processing apparatus and method of electronic commerce
- Patent Title (中): 电子商务监控系统，工艺处理装置及电子商务方法
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Application No.: US12395848Application Date: 2009-03-02
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Publication No.: US08045148B2Publication Date: 2011-10-25
- Inventor: Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
- Applicant: Hidetoshi Nishiyama , Minori Noguchi , Tetsuya Watanabe , Takuaki Sekiguchi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2002-225692 20020802
- Main IPC: G01N21/00
- IPC: G01N21/00
Abstract:
A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
Public/Granted literature
- US20090177413A1 System For Monitoring Foreign Particles, Process Processing Apparatus And Method Of Electronic Commerce Public/Granted day:2009-07-09
Information query
