Invention Grant
- Patent Title: Laser irradiation method and laser irradiation apparatus
- Patent Title (中): 激光照射方法和激光照射装置
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Application No.: US12536053Application Date: 2009-08-05
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Publication No.: US08045271B2Publication Date: 2011-10-25
- Inventor: Koichiro Tanaka , Hirotada Oishi
- Applicant: Koichiro Tanaka , Hirotada Oishi
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2004-145612 20040514
- Main IPC: G02B27/10
- IPC: G02B27/10

Abstract:
The present invention is to provide a laser irradiation technique for irradiating the irradiation surface with the laser beam having homogeneous intensity distribution using a cylindrical lens array without being affected by the intensity distribution of the original beam. A laser beam emitted from a laser oscillator is divided by two kinds of cylindrical lens arrays into a plurality of beams, which are two kinds of linear laser beams with their energy intensity distribution inverted each other, and the two kinds of linear laser beams are superposed in a minor-axis direction. This can form the linear laser beam having homogeneous intensity distribution on the irradiation surface.
Public/Granted literature
- US20090291569A1 LASER IRRADIATION METHOD AND LASER IRRADIATION APPARATUS Public/Granted day:2009-11-26
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