Invention Grant
US08048064B2 Method of curing inflammatory acne by using carbon lotion and pulsed laser
有权
使用碳酸钙和脉冲激光治疗炎症性痤疮的方法
- Patent Title: Method of curing inflammatory acne by using carbon lotion and pulsed laser
- Patent Title (中): 使用碳酸钙和脉冲激光治疗炎症性痤疮的方法
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Application No.: US12158350Application Date: 2006-05-29
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Publication No.: US08048064B2Publication Date: 2011-11-01
- Inventor: Hae Lyung Hwang , Sung Huan Gong , Jing Mei Li
- Applicant: Hae Lyung Hwang , Sung Huan Gong , Jing Mei Li
- Applicant Address: KR
- Assignee: Lutronic Corporation
- Current Assignee: Lutronic Corporation
- Current Assignee Address: KR
- Agency: Pepper Hamilton LLP
- Priority: KR10-2005-0128505 20051223
- International Application: PCT/KR2006/002043 WO 20060529
- International Announcement: WO2007/073024 WO 20070628
- Main IPC: A61B18/20
- IPC: A61B18/20

Abstract:
Disclosed is a method of curing inflammatory acne by applying a carbon lotion onto a face covered with acne, irradiating the applied carbon lotion with a laser pulse having a pulse width of microsecond, and irradiating the applied carbon lotion with a laser pulse having a pulse width of nanosecond to sterilize acne bacilli and open skin pores clogged with sebum, thereby entirely treating the inflammatory acne. The method includes applying the carbon lotion onto epidermis to be cured and pores, irradiating the carbon lotion with a laser pulse to heat and burst the applied carbon lotion. With the method, the inflammatory acne is simply cured without scar.
Public/Granted literature
- US20080319431A1 Method of Curing Inflammatory Acne by Using Carbon Lotion and Pulsed Laser Public/Granted day:2008-12-25
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