Invention Grant
US08048281B2 Method for producing tight pitched coil with reduced processing steps
有权
减少加工步骤生产紧密螺旋线圈的方法
- Patent Title: Method for producing tight pitched coil with reduced processing steps
- Patent Title (中): 减少加工步骤生产紧密螺旋线圈的方法
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Application No.: US12286993Application Date: 2008-10-02
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Publication No.: US08048281B2Publication Date: 2011-11-01
- Inventor: Christian Rene Bonhote , Quang Le , Ihavin Sinha
- Applicant: Christian Rene Bonhote , Quang Le , Ihavin Sinha
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Lorimer Labs
- Agent D'Arcy H. Lorimer
- Main IPC: C25D5/02
- IPC: C25D5/02 ; G11B5/17

Abstract:
Methods for fabricating thin film magnetic head coil structures are disclosed. The methods disclose deposition of a first thick seed layer, followed by deposition of an ultra-thin second seed layer. Coil structures having sub-micron pitch and high aspect ratios are deposited on the second ultra-thin seed layer, which is removed from between the coil windings via an isotropic etch process such as wet etching or RIE. Subsequent to selective removal of the ultra-thin second seed layer, the first thick seed layer is utilized to deposit pole and backgap structures, eliminating the need to deposit (and remove) a subsequent seed layer on the coil structure.
Public/Granted literature
- US20100084263A1 Method for producing tight pitched coil with reduced processing steps Public/Granted day:2010-04-08
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