Invention Grant
- Patent Title: Apparatus and method for plating a substrate
- Patent Title (中): 电镀基板的装置及方法
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Application No.: US12071353Application Date: 2008-02-20
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Publication No.: US08048282B2Publication Date: 2011-11-01
- Inventor: Masahiko Sekimoto , Fumio Kuriyama , Yasuhiko Endo , Stephen Strausser
- Applicant: Masahiko Sekimoto , Fumio Kuriyama , Yasuhiko Endo , Stephen Strausser
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Main IPC: C25D5/02
- IPC: C25D5/02 ; C25D17/00

Abstract:
A plating apparatus and method bubbles generated at the plating surfaces easily removed and the uniformity of the thickness of the plated film within the plated surface can be improved. The plating apparatus has a cassette table for loading a cassette in which a substrate having a plating surface is contained. An aligner for aligning the substrate, a rinser-dryer for rinsing and drying the substrate, and a plating unit for plating the substrate are also provided. The plating unit includes a plating vessel containing a plating solution, and a holder holds the substrate to immerse the substrate in the plating solution in the plating vessel. The plating surface is exposed to a nozzle which ejects the plating solution toward the plating surface.
Public/Granted literature
- US20090045068A1 Apparatus and method for plating a substrate Public/Granted day:2009-02-19
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