Invention Grant
US08048354B2 Method of forming supports bearing features, such as lithography masks
有权
形成支撑轴承特征的方法,例如光刻掩模
- Patent Title: Method of forming supports bearing features, such as lithography masks
- Patent Title (中): 形成支撑轴承特征的方法,例如光刻掩模
-
Application No.: US12092911Application Date: 2006-11-09
-
Publication No.: US08048354B2Publication Date: 2011-11-01
- Inventor: Stephan Landis , Jean-Philippe Gouy
- Applicant: Stephan Landis , Jean-Philippe Gouy
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique
- Current Assignee: Commissariat a l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Brinks Hofer Gilson & Lione
- Priority: FR0511401 20051109
- International Application: PCT/FR2006/002496 WO 20061109
- International Announcement: WO2007/054643 WO 20070518
- Main IPC: B29C33/40
- IPC: B29C33/40

Abstract:
To manufacture a support made of at least one predetermined material and bearing features: a plurality of superposed layers is produced on a substrate that it is known how to remove, each of the layers being formed from zones of at least two different materials, the geometry of the zones and the constituent materials of these superposed layers being defined so as to form said features, on the reverse side of the substrate, these features being of 3D type, and some of these features differing in height among themselves and/or with other features; a layer of the predetermined material is produced on this multilayer stack; and at least the substrate is eliminated whereby, after inversion, said support with said features is obtained.
Public/Granted literature
- US20080268351A1 Method of Forming Supports Bearing Features, Such as Lithography Masks Public/Granted day:2008-10-30
Information query