Invention Grant
- Patent Title: Method and apparatus for removing radiation side lobes
- Patent Title (中): 用于去除辐射旁瓣的方法和装置
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Application No.: US10970077Application Date: 2004-10-20
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Publication No.: US08048588B2Publication Date: 2011-11-01
- Inventor: Sia Kim Tan , Soon Yoeng Tan , Qunying Lin , Huey Ming Chong , Liang-Choo Hsia
- Applicant: Sia Kim Tan , Soon Yoeng Tan , Qunying Lin , Huey Ming Chong , Liang-Choo Hsia
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agent Mikio Ishimaru
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03C5/00 ; G06F17/50

Abstract:
A method and structure for removing side lobes is provided by positioning first and second radiation transparent regions of respective first and second phases at a first plane with the first and second phases being substantially out of phase. Further, positioning the first and the second region to cause radiation at a second plane to be neutralized in a first region, not to be neutralized in a second region, and to have a side lobe in a third region. Further, positioning a non-transparent region at the first plane to assure radiation at the second plane to be neutralized in the first region and positioning a third radiation transparent region of the first or second phase at the first plane to neutralize the side lobes in the third region at the second plane.
Public/Granted literature
- US20060083994A1 Method and apparatus for removing radiation side lobes Public/Granted day:2006-04-20
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