Invention Grant
US08048591B2 Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
有权
掩模坯料玻璃基板，掩模坯料玻璃基板制造方法，掩模坯料制造方法和掩模制造方法
- Patent Title: Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
- Patent Title (中): 掩模坯料玻璃基板，掩模坯料玻璃基板制造方法，掩模坯料制造方法和掩模制造方法
-
Application No.: US12486106Application Date: 2009-06-17
-
Publication No.: US08048591B2Publication Date: 2011-11-01
- Inventor: Hisashi Kasahara , Yasushi Okubo
- Applicant: Hisashi Kasahara , Yasushi Okubo
- Applicant Address: JP Tokyo
- Assignee: Hoya Corporation
- Current Assignee: Hoya Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-158765 20080618
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation of a transfer pattern, of the mask blank glass substrate. Each of the pits forming the marker is a round hole with its edge portion being generally circular and a distance L1 between the edge portions of the adjacent pits is 50 μm or more. The marker is formed, for example, on an end face of the mask blank glass substrate.
Public/Granted literature
Information query
