Invention Grant
US08048609B2 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s
有权
含有聚（乙烯基羟基芳基羧酸酯）的辐射敏感组合物和元素
- Patent Title: Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s
- Patent Title (中): 含有聚（乙烯基羟基芳基羧酸酯）的辐射敏感组合物和元素
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Application No.: US12339469Application Date: 2008-12-19
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Publication No.: US08048609B2Publication Date: 2011-11-01
- Inventor: Moshe Levanon , Georgy Bylina , Vladimir Kampel , Larisa Postel , Marina Rubin , Tanya Kurtser
- Applicant: Moshe Levanon , Georgy Bylina , Vladimir Kampel , Larisa Postel , Marina Rubin , Tanya Kurtser
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucker
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30
Abstract:
A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved sensitivity and solvent resistance. These elements are useful for making lithographic printing plates and printed circuit boards. The composition includes a water-insoluble polymeric binder that has at least 20 mol % of recurring units comprising hydroxyaryl carboxylic acid ester groups, some of which can be substituted with cyclic imide moieties.
Public/Granted literature
- US20100159390A1 RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS CONTAINING POLY(VINYL HYDROXYARYL CARBOXYLIC ACID ESTER)S Public/Granted day:2010-06-24
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