Invention Grant
US08048693B2 Methods and structures for relaxation of strained layers 有权
应变层松弛的方法和结构

Methods and structures for relaxation of strained layers
Abstract:
The present invention provides methods for relaxing a strained-material layer and structures produced by the methods. Briefly, the methods include depositing a first low-viscosity layer that includes a first compliant material on the strained-material layer, depositing a second low-viscosity layer that includes a second compliant material on the strained-material layer to form a first sandwiched structure and subjecting the first sandwiched structure to a heat treatment such that the reflow of the first and the second low-viscosity layers permits the strained-material layer to at least partly relax.
Public/Granted literature
Information query
Patent Agency Ranking
0/0