Invention Grant
- Patent Title: Photoelectric conversion device and method for producing photoelectric conversion device
- Patent Title (中): 光电转换装置及光电转换装置的制造方法
-
Application No.: US12235055Application Date: 2008-09-22
-
Publication No.: US08048710B2Publication Date: 2011-11-01
- Inventor: Sakae Hashimoto
- Applicant: Sakae Hashimoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2004-355364 20041208
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A photoelectric conversion device according to the present invention has a plurality of photoreceiving portions provided in a substrate, an interlayer film overlying the photoreceiving portion, a large refractive index region which is provided so as to correspond to the photoreceiving portion and has a higher refractive index than the interlayer film, and a layer which is provided in between the photoreceiving portion and the large refractive index region, and has a lower etching rate than the interlayer film, wherein the layer of the lower etching rate is formed so as to cover at least the whole surface of the photoreceiving portion. In addition, the layer of the lower etching rate has a refractive index in between the refractive indices of the large refractive index region and the substrate. Such a configuration can provide the photoelectric conversion device which inhibits the lowering of the sensitivity and the variation of the sensitivity among picture elements.
Public/Granted literature
- US20090023292A1 PHOTOELECTRIC CONVERSION DEVICE AND METHOD FOR PRODUCING PHOTOELECTRIC CONVERSION DEVICE Public/Granted day:2009-01-22
Information query
IPC分类: