To provide an amorphous silica powder suitable for a sealing material for semiconductors having improved HTSL properties and HTOL properties, and a process for its production.An amorphous silica powder containing Al in an amount of from 0.03 to 20 mass % as calculated as Al2O3 measured by atomic absorption spectrophotometry, wherein the average particle size is at most 50 μm, and when the amorphous silica powder is divided according to the average particle size into two powders, a powder having a particle size smaller than the average particle size has a higher content as calculated as Al2O3 than a powder having a particle size larger than the average particle size.