A method of manufacturing a microelectronic device including imprinting a layer on a substrate with an imprinted pattern, the imprinted pattern defining a first anchor impression within the layer that includes a first base region positioned adjacent the layer and a first distal region positioned opposite the first base region, the first distal region defining a cross sectional area greater than a cross sectional area of the first base region, and the imprinted pattern defining a second anchor impression within the layer that includes a second base region positioned adjacent the layer and a second distal region positioned opposite the second base region, the second distal region defining a cross sectional area greater than a cross sectional area of the second base region and greater than a cross sectional area of the first distal region.