Invention Grant
- Patent Title: Circuit substrate and method for fabricating inductive circuit
- Patent Title (中): 电路基板和制造感应电路的方法
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Application No.: US12175720Application Date: 2008-07-18
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Publication No.: US08049116B2Publication Date: 2011-11-01
- Inventor: Pao-Nan Lee , Chi-Tsung Chiu
- Applicant: Pao-Nan Lee , Chi-Tsung Chiu
- Applicant Address: TW Kaohsiung
- Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee Address: TW Kaohsiung
- Agency: J.C. Patents
- Priority: TW96126891A 20070724
- Main IPC: H05K1/16
- IPC: H05K1/16 ; H01F21/00

Abstract:
A circuit substrate including a laminated layer, an embedded electronic device, at least a circuit structure, and a solder mask layer is provided. The embedded electronic device is disposed within the laminated layer. The circuit structure is disposed on a surface of the laminated layer and is connected between a reference plane and the embedded electronic device. In addition, the solder mask layer is disposed on the surface of the laminated layer and exposes a portion of the circuit structure. The circuit structure has a specific layout by which a circuit trace with an adjustable length can be formed by disconnecting or connecting the exposed portion of the circuit structure.
Public/Granted literature
- US20090025964A1 CIRCUIT SUBSTRATE AND METHOD FOR FABRICATING INDUCTIVE CIRCUIT Public/Granted day:2009-01-29
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