Invention Grant
- Patent Title: Charged particle system
- Patent Title (中): 带电粒子系统
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Application No.: US12090636Application Date: 2006-10-20
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Publication No.: US08049189B2Publication Date: 2011-11-01
- Inventor: Herbert Buschbeck , Elmar Platzgummer , Gerhard Stengl , Herbert Vonach
- Applicant: Herbert Buschbeck , Elmar Platzgummer , Gerhard Stengl , Herbert Vonach
- Applicant Address: DE Jena
- Assignee: Carl Zeiss SMS GmbH
- Current Assignee: Carl Zeiss SMS GmbH
- Current Assignee Address: DE Jena
- Agent Bruce D Ritter
- Priority: EP05022915 20051020
- International Application: PCT/EP2006/010158 WO 20061020
- International Announcement: WO2007/045501 WO 20070426
- Main IPC: G21K1/00
- IPC: G21K1/00

Abstract:
A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411′), and an inner pole piece (412) having a lowermost end (412′) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.
Public/Granted literature
- US20080210887A1 Charged Particle System Public/Granted day:2008-09-04
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