Invention Grant
- Patent Title: Image sensor and method for manufacturing the same
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US12248758Application Date: 2008-10-09
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Publication No.: US08049289B2Publication Date: 2011-11-01
- Inventor: Seung Ryong Park
- Applicant: Seung Ryong Park
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: The Law Offices of Andrew D. Fortney
- Agent Andrew D. Fortney
- Priority: KR10-2007-0102352 20071011; KR10-2008-0087380 20080904
- Main IPC: H01L31/0232
- IPC: H01L31/0232 ; H01L31/18

Abstract:
Disclosed are an image sensor and a method for manufacturing the same. The image sensor includes a semiconductor substrate including a unit pixel, first to third color filters provided on the semiconductor substrate, a first micro-lens provided on each of the first and third color filters, and a second micro-lens provided on the second color filter, in which an outer periphery of the first micro-lens has a square shape, and an upper portion of the first micro-lens has a semi-spherical or convex shape.
Public/Granted literature
- US20090096050A1 Image Sensor and Method for Manufacturing the Same Public/Granted day:2009-04-16
Information query
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