Invention Grant
- Patent Title: Zone-optimized mirrors and optical systems using same
- Patent Title (中): 区域优化的镜子和使用它的光学系统
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Application No.: US12387625Application Date: 2009-05-05
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Publication No.: US08050380B2Publication Date: 2011-11-01
- Inventor: Fabio Zocchi , Jacques Kools
- Applicant: Fabio Zocchi , Jacques Kools
- Applicant Address: IT Bosisio Parini
- Assignee: Media Lario, S.r.L.
- Current Assignee: Media Lario, S.r.L.
- Current Assignee Address: IT Bosisio Parini
- Agency: Opticus IP Law PLLC
- Main IPC: G21K5/04
- IPC: G21K5/04 ; G02B5/08
Abstract:
A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation (18) includes a reflective surface (S) having two or more substantially discrete zones (Z1, Z2, . . . Zn) that include respective coatings (C1, C2, . . . Cn). Each coating is configured to optimally reflect a select range of incident angles of the radiation incident thereon. An EUV optical system (10) and an EUV lithography system (200) that includes at least one zone-optimized mirror are also disclosed.
Public/Granted literature
- US20100284511A1 Zone-optimized mirrors and optical systems using same Public/Granted day:2010-11-11
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