To provide a method for manufacturing a holographic recording medium and a method for manufacturing a semiconductor device, by which effects of distortion or irregularities of the surface of an exposure object can be reduced. The method includes the steps of: splitting a laser beam emitted from a laser oscillator into a first laser beam and a second laser beam, and forming a fringe pattern in a holographic recording medium by illuminating the holographic recording medium with the first laser beam through a mask and illuminating the holographic recording medium with the second laser beam. The mask is a substrate having a light-shielding film formed over its surface.