Invention Grant
US08053297B2 Method of fabricating a thin film transistor using joule heat from the gate electrode to form a crystallized channel region 有权
使用来自栅电极的焦耳热制造薄膜晶体管以形成晶化沟道区的方法

  • Patent Title: Method of fabricating a thin film transistor using joule heat from the gate electrode to form a crystallized channel region
  • Patent Title (中): 使用来自栅电极的焦耳热制造薄膜晶体管以形成晶化沟道区的方法
  • Application No.: US12906830
    Application Date: 2010-10-18
  • Publication No.: US08053297B2
    Publication Date: 2011-11-08
  • Inventor: In-Young Jung
  • Applicant: In-Young Jung
  • Applicant Address: KR Giheung-Gu, Yongin, Gyunggi-Do
  • Assignee: Samsung Mobile Display Co., Ltd.
  • Current Assignee: Samsung Mobile Display Co., Ltd.
  • Current Assignee Address: KR Giheung-Gu, Yongin, Gyunggi-Do
  • Agent Robert E. Bushnell, Esq.
  • Priority: KR10-2006-0123078 20061206
  • Main IPC: H01L21/00
  • IPC: H01L21/00 H01L21/84
Method of fabricating a thin film transistor using joule heat from the gate electrode to form a crystallized channel region
Abstract:
A thin film transistor (TFT) having improved characteristics, a method for fabricating the same, and an organic light emitting display device (OLED) including the same. The TFT is constructed with a substrate, a semiconductor layer disposed on the substrate and including a channel region, source and drain regions, a gate insulating layer disposed on the semiconductor layer, a gate electrode disposed on the gate insulating layer and corresponding to the channel region, an interlayer insulating layer disposed on the gate electrode, and source and drain electrodes electrically connected to the source and drain regions of the semiconductor layer. The channel region is made from polycrystalline silicon (poly-Si), and the source and drain regions are made from amorphous silicon (a-Si). The polycrystalline silicon of the channel region is formed by crystallizing amorphous silicon using Joule's heat generated by the gate electrode.
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