Invention Grant
- Patent Title: Lens cleaning module for immersion lithography apparatus
- Patent Title (中): 用于浸没式光刻设备的镜头清洁模块
-
Application No.: US11222319Application Date: 2005-09-07
-
Publication No.: US08054444B2Publication Date: 2011-11-08
- Inventor: Burn-Jeng Lin , David Lu
- Applicant: Burn-Jeng Lin , David Lu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is provided. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in a non-manual cleaning process.
Public/Granted literature
- US20060028628A1 Lens cleaning module Public/Granted day:2006-02-09
Information query
