Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11499855Application Date: 2006-08-07
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Publication No.: US08054445B2Publication Date: 2011-11-08
- Inventor: Hans Jansen , Christiaan Alexander Hoogendam , Timotheus Franciscus Sengers , Anthonie Kuijper
- Applicant: Hans Jansen , Christiaan Alexander Hoogendam , Timotheus Franciscus Sengers , Anthonie Kuijper
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors.
Public/Granted literature
- US20070041001A1 Lithographic apparatus and device manufacturing method Public/Granted day:2007-02-22
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