Invention Grant
US08054448B2 Apparatus and method for providing fluid for immersion lithography
有权
用于提供浸没光刻的流体的装置和方法
- Patent Title: Apparatus and method for providing fluid for immersion lithography
- Patent Title (中): 用于提供浸没光刻的流体的装置和方法
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Application No.: US11579442Application Date: 2005-04-27
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Publication No.: US08054448B2Publication Date: 2011-11-08
- Inventor: Alex Ka Tim Poon , Leonard Wai Fung Kho
- Applicant: Alex Ka Tim Poon , Leonard Wai Fung Kho
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- International Application: PCT/US2005/014200 WO 20050427
- International Announcement: WO2005/111722 WO 20051124
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity in a direction that is different than a direction in which the nozzle moves. The immersion fluid can also be injected at different rates into the inner cavity at different sides. A wafer substrate is then exposed by light through the immersion fluid.
Public/Granted literature
- US20070222967A1 Apparatus and Method for Providing Fluid for Immersion Lithography Public/Granted day:2007-09-27
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