Invention Grant
- Patent Title: Porous metal thin film, method for manufacturing the same, and capacitor
- Patent Title (中): 多孔金属薄膜,其制造方法和电容器
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Application No.: US12330066Application Date: 2008-12-08
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Publication No.: US08054611B2Publication Date: 2011-11-08
- Inventor: Masao Mizuno
- Applicant: Masao Mizuno
- Applicant Address: JP Kobe-shi
- Assignee: Kobe Steel, Ltd.
- Current Assignee: Kobe Steel, Ltd.
- Current Assignee Address: JP Kobe-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-001454 20080108
- Main IPC: H01G9/14
- IPC: H01G9/14 ; H01G9/15 ; H01G9/004 ; H01G9/045 ; B32B3/10

Abstract:
A porous metal thin film formed from aluminum has a film structure in which domains having an average diameter of 200 nm or more, and 500 nm or less and being formed through aggregation of a plurality of grains having an average grain diameter of 50 nm or more, and 160 nm or less are distributed discretely at an average distance of 5 nm or more, and 40 nm or less, wherein the area occupied by the above-described domains is 60% or more, and 90% or less in a cross-section in any direction of the porous metal thin film.
Public/Granted literature
- US20090174987A1 POROUS METAL THIN FILM, METHOD FOR MANUFACTURING THE SAME, AND CAPACITOR Public/Granted day:2009-07-09
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