Invention Grant
- Patent Title: Method for inspecting a foreign matter on mirror-finished substrate
- Patent Title (中): 用于检查镜面基材上异物的方法
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Application No.: US11911594Application Date: 2006-04-19
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Publication No.: US08055055B2Publication Date: 2011-11-08
- Inventor: Taizou Hamada , Tatsutoshi Suenaga
- Applicant: Taizou Hamada , Tatsutoshi Suenaga
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: RatnerPrestia
- Priority: JP2005-120569 20050419
- International Application: PCT/JP2006/308172 WO 20060419
- International Announcement: WO2006/112466 WO 20061026
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
Provided is a foreign matter inspection method for positively detecting a foreign matter in the neighborhood of the edge of a mirror-finished substrate without fail. Edge-emphasis and binarization are performed following the taking of an image of a substrate-under-inspection at a contour of its inspection area, to further detect a plurality of sampling points representative of a contour of the inspection area. An estimated inspection area is determined by determining the size, position and rotation angle of contour lines defined, size-reducibly, from the coordinates of the plurality of sampling points. After applying a mask to the binary image data in an area other than the estimated inspection area, a foreign-matter detection step is performed.
Public/Granted literature
- US20090034829A1 METHOD FOR INSPECTING A FOREIGN MATTER ON MIRROR-FINISHED SUBSTRATE Public/Granted day:2009-02-05
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