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US08055125B2 Substrate stage mechanism and substrate processing apparatus 失效
基板台机构和基板加工装置

Substrate stage mechanism and substrate processing apparatus
Abstract:
A substrate stage mechanism (10) configured to place a substrate (W) thereon inside a process container of a substrate processing apparatus (100) and having a substrate heating function for heating the substrate (W) includes a substrate table (11) including a base body (11a) configured to place the substrate (W) thereon and a heating element (13) provided to the base body (11a) and configured to heat the substrate (W); a support member (12) having an upper end connected to the substrate table (11) and a lower end attached to the process container; and a heating device (17) configured to heat the support member (12).
Abstract(Chinese):

一种基板台机构（10），其构造为将基板（W）放置在基板处理装置（100）的处理容器内并具有用于加热基板（W）的基板加热功能的基板台机构（10）包括：基板台（11） 配置为将基板（W）放置在其上的基体（11a）和设置在基体（11a）上并构造为加热基板（W）的加热元件（13） 支撑构件（12），其具有连接到衬底台（11）的上端和附接到处理容器的下端; 以及被配置为加热所述支撑构件（12）的加热装置（17）。

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