Invention Grant
US08055370B1 Apparatus and methods for monitoring health of semiconductor process systems 有权
用于监测半导体工艺系统健康的装置和方法

Apparatus and methods for monitoring health of semiconductor process systems
Abstract:
Disclosed are apparatus and methods for monitoring an operation parameter of a process tool, independently of a process system recipe, are provided. In general, an indirect effect that results from implementing an event from a process system recipe on the process system is monitored without using the specific values or setpoints that are entered for such event into the process system to thereby change a state of such process system. In one embodiment, the behavior of a process device as it transitions between different states is monitored for a single cycle of operation or over time to detect trends that indicate a potential failure of the process device. When a trend that indicates a potential failure is detected, an alarm is generated. In one implementation, the time for reaching a particular stage of operation may be repeatedly monitored over a plurality of device cycles. For example, the time to open a valve or door may be monitored. In another example, the time for reaching a stable phase of gas flow after a ramping stage has commenced is monitored. When the time for reaching a particular stage begins to decline by a predetermined amount, an alarm may be generated.
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