Invention Grant
US08055370B1 Apparatus and methods for monitoring health of semiconductor process systems
有权
用于监测半导体工艺系统健康的装置和方法
- Patent Title: Apparatus and methods for monitoring health of semiconductor process systems
- Patent Title (中): 用于监测半导体工艺系统健康的装置和方法
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Application No.: US11473890Application Date: 2006-06-23
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Publication No.: US08055370B1Publication Date: 2011-11-08
- Inventor: Jeffery William Achtnig , Russell Fleming , Jaideep Jain
- Applicant: Jeffery William Achtnig , Russell Fleming , Jaideep Jain
- Applicant Address: US CA San Jose
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: G04F7/00
- IPC: G04F7/00 ; G05B19/18 ; G05B23/02 ; G06F19/00

Abstract:
Disclosed are apparatus and methods for monitoring an operation parameter of a process tool, independently of a process system recipe, are provided. In general, an indirect effect that results from implementing an event from a process system recipe on the process system is monitored without using the specific values or setpoints that are entered for such event into the process system to thereby change a state of such process system. In one embodiment, the behavior of a process device as it transitions between different states is monitored for a single cycle of operation or over time to detect trends that indicate a potential failure of the process device. When a trend that indicates a potential failure is detected, an alarm is generated. In one implementation, the time for reaching a particular stage of operation may be repeatedly monitored over a plurality of device cycles. For example, the time to open a valve or door may be monitored. In another example, the time for reaching a stable phase of gas flow after a ramping stage has commenced is monitored. When the time for reaching a particular stage begins to decline by a predetermined amount, an alarm may be generated.
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