Invention Grant
- Patent Title: Flow rate measuring device, and gas supply system employing it, method for specifying gas appliance
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Application No.: US12477407Application Date: 2009-06-03
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Publication No.: US08055457B2Publication Date: 2011-11-08
- Inventor: Yasuhiro Umekage , Hajime Miyata , Kenichi Kamon
- Applicant: Yasuhiro Umekage , Hajime Miyata , Kenichi Kamon
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2006-332988 20061211
- Main IPC: G01F1/00
- IPC: G01F1/00

Abstract:
A flow rate measuring device has a flow rate measurement unit, an appliance registering unit, a calculating unit, a determining unit, a first appliance identifying unit, and a second appliance identifying unit. The appliance registering unit stores at least first gas flow rate variation profiles on activation of respective gas appliances coupled to a flow channel, and second gas flow rate variation profiles based on the control specific to the respective gas appliances. The first appliance identifying unit identifies which gas appliance is activated based on the first gas flow rate variation profiles on activation. When a determining unit detects a stop of any of gas appliances, the second appliance identifying unit identifies a gas appliance in continuous use by using the second gas flow rate variation profiles based on the control specific to the respective gas appliances.
Public/Granted literature
- US08099248B2 Flow rate measuring device, and gas supply system employing it, method for specifying gas appliance Public/Granted day:2012-01-17
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