Invention Grant
- Patent Title: Exposure apparatus, image forming apparatus and heating method
- Patent Title (中): 曝光装置，成像装置和加热方法
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Application No.: US12021502Application Date: 2008-01-29
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Publication No.: US08059147B2Publication Date: 2011-11-15
- Inventor: Yoshihiko Taira , Youji Houki , Yukihiro Matsushita
- Applicant: Yoshihiko Taira , Youji Houki , Yukihiro Matsushita
- Applicant Address: JP Tokyo
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-056949 20070307
- Main IPC: B41J15/14
- IPC: B41J15/14 ; B41J27/00 ; B41J2/45
Abstract:
The exposure apparatus is provided with: a substrate; plural light emitting elements that are arranged in a line on a first surface of the substrate; and a heating unit that heats the substrate from the first surface side.
Public/Granted literature
- US20080218710A1 EXPOSURE APPARATUS, IMAGE FORMING APPARATUS AND HEATING METHOD Public/Granted day:2008-09-11
Information query
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