Invention Grant
- Patent Title: Display device and method for manufacturing the same
- Patent Title (中): 显示装置及其制造方法
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Application No.: US12668866Application Date: 2008-07-11
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Publication No.: US08059222B2Publication Date: 2011-11-15
- Inventor: Hiromi Katoh , Benjamin James Hadwen
- Applicant: Hiromi Katoh , Benjamin James Hadwen
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Nixon & Vanderhye, P.C.
- Priority: JP2007-188534 20070719
- International Application: PCT/JP2008/062592 WO 20080711
- International Announcement: WO2009/011310 WO 20090122
- Main IPC: G02F1/136
- IPC: G02F1/136

Abstract:
An active matrix substrate in which variations in output characteristics of photodiodes are reduced, and a display device using this active matrix substrate, are provided. An active matrix substrate (1) having an n-TFT (20), a p-TFT (30), and a photodiode (10) is used. The photodiode (10) includes a p-layer (7), an i-layer (8), and an n-layer (9). The i-layer (8) includes a p-type semiconductor region (8a) at a position adjacent to the player (7), said p-type semiconductor region (8a) having a diffusion concentration of p-type impurities that is set at the same level as that of a diffusion concentration of p-type impurities in the channel region (23) of the n-TFT (20); and an n-type semiconductor region (8b) at a position adjacent to the n-layer (9), said n-type semiconductor region (8b) having a diffusion concentration of n-type impurities that is set at the same level as that of a diffusion concentration of n-type impurities in the channel region (33) of the p-TFT (30).
Public/Granted literature
- US20100181570A1 DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-07-22
Information query
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