Invention Grant
US08059884B2 Method and system for obtaining bounds on process parameters for OPC-verification
有权
用于获取OPC验证过程参数界限的方法和系统
- Patent Title: Method and system for obtaining bounds on process parameters for OPC-verification
- Patent Title (中): 用于获取OPC验证过程参数界限的方法和系统
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Application No.: US11937073Application Date: 2007-11-08
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Publication No.: US08059884B2Publication Date: 2011-11-15
- Inventor: Maharaj Mukherjee , Ioana Graur , Alan E. Rosenbluth
- Applicant: Maharaj Mukherjee , Ioana Graur , Alan E. Rosenbluth
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Yuanmin Cai
- Main IPC: G06K9/20
- IPC: G06K9/20
Abstract:
Embodiments of the present invention provide a method of performing printability verification of a mask layout. The method includes creating one or more tight clusters; computing a set of process parameters associated with a point on said mask; comparing said set of process parameters to said one or more tight clusters; and reporting an error when at least one of said process parameters is away from said one or more tight clusters.
Public/Granted literature
- US20090123057A1 Method and System for Obtaining Bounds on Process Parameters for OPC-Verification Public/Granted day:2009-05-14
Information query
