Invention Grant
- Patent Title: Supporting device, optical apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 支撑装置,光学装置,曝光装置和装置制造方法
-
Application No.: US12876921Application Date: 2010-09-07
-
Publication No.: US08064152B2Publication Date: 2011-11-22
- Inventor: Yuji Sudoh
- Applicant: Yuji Sudoh
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2009-210353 20090911
- Main IPC: G02B7/02
- IPC: G02B7/02

Abstract:
The present invention provides a supporting device that supports an optical element, comprising: a first supporting member that is fixed to an outer circumference of the optical element; a plurality of members that is connected to an outer circumference of the first supporting member; and a second supporting member that supports the first supporting member via the plurality of members, wherein each of the plurality of members is configured such that the a rigidity thereof in a first direction inclined relative to a direction orthogonal to an optical axis of the optical element in a plane including the optical axis is lower than a rigidity thereof in each of two directions that are orthogonal to the first direction and that are orthogonal to each other.
Public/Granted literature
- US20110063740A1 SUPPORTING DEVICE, OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-03-17
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |