Invention Grant
- Patent Title: Thermal processing apparatus and thermal processing method for object to be processed
- Patent Title (中): 热处理设备和待处理物体的热处理方法
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Application No.: US12481754Application Date: 2009-06-10
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Publication No.: US08080767B2Publication Date: 2011-12-20
- Inventor: Kenichi Yamaga , Wenling Wang
- Applicant: Kenichi Yamaga , Wenling Wang
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2008-153552 20080611
- Main IPC: F27B5/18
- IPC: F27B5/18 ; F27D19/00 ; G01K1/14 ; G01K7/32 ; H01L21/02 ; H01L21/66

Abstract:
A thermal processing apparatus comprising a processing vessel containing, in addition to a plurality of objects subject to heat treatment, an acoustic wave device for temperature measurement. A holding unit holds the plurality of objects to be processed and an object for temperature measurement utilizing an acoustic wave device. A heating unit heats the objects to be processed and the object for temperature measurement. A first conductive member functions as an antenna for transmitting an electromagnetic wave toward the acoustic wave device in the processing vessel; a second conductive member functions as a receiver antenna for receiving an electromagnetic wave dependent on a temperature of the acoustic wave device which is emitted from the acoustic wave device. A temperature analysis part obtains a temperature of the object based on the electromagnetic wave received by the receiver antenna, and a temperature control part controls the heating unit. The first and second conductive members are each part of the thermal processing parts in the processing vessel.
Public/Granted literature
- US20090311807A1 THERMAL PROCESSING APPARATUS AND THERMAL PROCESSING METHOD FOR OBJECT TO BE PROCESSED Public/Granted day:2009-12-17
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