Invention Grant
US08084854B2 Pass-through 3D interconnect for microelectronic dies and associated systems and methods
有权
用于微电子管芯的直通3D互连及相关系统和方法
- Patent Title: Pass-through 3D interconnect for microelectronic dies and associated systems and methods
- Patent Title (中): 用于微电子管芯的直通3D互连及相关系统和方法
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Application No.: US11966824Application Date: 2007-12-28
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Publication No.: US08084854B2Publication Date: 2011-12-27
- Inventor: David S. Pratt , Kyle K. Kirby , Dewali Ray
- Applicant: David S. Pratt , Kyle K. Kirby , Dewali Ray
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L23/04
- IPC: H01L23/04

Abstract:
Pass-through 3D interconnects and microelectronic dies and systems of stacked dies that include such interconnects are disclosed herein. In one embodiment, a system of stacked dies includes a first microelectronic die having a substrate, a metal substrate pad, and a first integrated circuit electrically coupled to the substrate pad. A pass-through 3D interconnect extends between front and back sides of the substrate, including through the substrate pad. The pass-through interconnect is electrically isolated from the substrate pad and electrically coupled to a second integrated circuit of a second microelectronic die attached to the back side of the substrate. In another embodiment, the first integrated circuit is a first memory device and the second integrated circuit is a second memory device, and the system uses the pass-through interconnect as part of an independent communication path to the second memory device.
Public/Granted literature
- US20090166846A1 PASS-THROUGH 3D INTERCONNECT FOR MICROELECTRONIC DIES AND ASSOCIATED SYSTEMS AND METHODS Public/Granted day:2009-07-02
Information query
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