Invention Grant
- Patent Title: Method for X-ray wavelength measurement and X-ray wavelength measurement apparatus
- Patent Title (中): X射线波长测量方法和X射线波长测量装置
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Application No.: US12645016Application Date: 2009-12-22
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Publication No.: US08085900B2Publication Date: 2011-12-27
- Inventor: Kazuhiko Omote
- Applicant: Kazuhiko Omote
- Applicant Address: JP Tokyo
- Assignee: Rigaku Corporation
- Current Assignee: Rigaku Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-180189 20060629
- Main IPC: G21K1/06
- IPC: G21K1/06

Abstract:
A Method for X-ray wavelength measurement and an X-ray wavelength measurement apparatus capable of determining absolute wavelength easily and carrying out wavelength measurement having high precision with a simple structure are provided. The present invention is a Method for X-ray wavelength measurement carried out by using a channel-cut crystal for wavelength measurement (20) in which two opposing cut planes are formed and the lattice constant of which is known, and the method diffracts X-ray in respective arrangements (−, +) and (+, −) of the channel-cut crystal for wavelength measurement (20), to determine the absolute wavelength of the X-ray from the difference between crystal rotation angles in respective arrangements. This makes the alignment simpler, and, when only a channel-cut crystal suitable for measurement can be prepared, X-ray wavelength measurement can be carried out easily and with high precision.
Public/Granted literature
- US20100111254A1 METHOD FOR X-RAY WAVELENGTH MEASUREMENT AND X-RAY WAVELENGTH MEASUREMENT APPARATUS Public/Granted day:2010-05-06
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