Invention Grant
- Patent Title: Method of producing an electronic device
- Patent Title (中): 电子设备的制造方法
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Application No.: US11905831Application Date: 2007-10-04
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Publication No.: US08087136B2Publication Date: 2012-01-03
- Inventor: Kazushige Ito , Akira Sato
- Applicant: Kazushige Ito , Akira Sato
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-252595 20040831
- Main IPC: H01G7/00
- IPC: H01G7/00

Abstract:
An electronic device having an element body, wherein dielectric layers and internal electrode layers are alternately stacked, wherein a hetero phase is formed in the dielectric layers and/or the internal electrode layers; and the hetero phase includes a Mg element and a Mn element. Preferably, the hetero phase is formed at least at a part near boundaries of the dielectric layers and the internal electrode layers.
Public/Granted literature
- US20080110006A1 Electronic device and the prduction method Public/Granted day:2008-05-15
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