Invention Grant
US08087637B2 Self-regulating valve for controlling the gas flow in high pressure systems
有权
用于控制高压系统中气体流量的自调节阀
- Patent Title: Self-regulating valve for controlling the gas flow in high pressure systems
- Patent Title (中): 用于控制高压系统中气体流量的自调节阀
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Application No.: US11918092Application Date: 2005-04-07
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Publication No.: US08087637B2Publication Date: 2012-01-03
- Inventor: Fanping Sun , Zaffir Chaudhry , Muhidin A. Lelic
- Applicant: Fanping Sun , Zaffir Chaudhry , Muhidin A. Lelic
- Applicant Address: GB Sunbury-On-Thames, England
- Assignee: Chubb International Holdings Limited
- Current Assignee: Chubb International Holdings Limited
- Current Assignee Address: GB Sunbury-On-Thames, England
- Agency: Kinney & Lange, P.A.
- International Application: PCT/US2005/012790 WO 20050407
- International Announcement: WO2006/110148 WO 20061019
- Main IPC: F16K31/12
- IPC: F16K31/12

Abstract:
A controlled pressure release valve controls the gas flow in high-pressure systems. The valve includes a valve body, a slidable spool, a primary flow passage, a first and second chamber, a first and second spring, a first and second passages, and a valve actuator. The valve body has a gas inlet and a gas outlet and houses the slidable spool. The slidable spool has a first end and a second end, and is slidable between a first position and a second position. The primary flow passage connects the gas inlet and the gas outlet and increases with lineal movement of the slidable spool. The first chamber is located adjacent the first end of the slidable spool and a second chamber is located adjacent the second end of the slidable spool. The sliding spool is biased toward the first position by a gas pressure applied by the second chamber and the second spring.
Public/Granted literature
- US20090173900A1 Self-Regulating Valve for Controlling the Gas Flow in High Pressure Systems Public/Granted day:2009-07-09
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