Invention Grant
- Patent Title: System for control of gas injectors
- Patent Title (中): 气体喷射器控制系统
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Application No.: US11373408Application Date: 2006-03-09
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Publication No.: US08088223B2Publication Date: 2012-01-03
- Inventor: Michael A. Todd , Keith D. Weeks , Paul T. Jacobson
- Applicant: Michael A. Todd , Keith D. Weeks , Paul T. Jacobson
- Applicant Address: US AZ Phoenix
- Assignee: ASM America, Inc.
- Current Assignee: ASM America, Inc.
- Current Assignee Address: US AZ Phoenix
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/52 ; C23C16/06 ; C23C16/22
Abstract:
A substrate processing system has computer controlled injectors. The computer is configured to adjust a plurality of injectors, such as during deposition of a graded layer, between depositions of two different layers, or between deposition and chamber clean steps.
Public/Granted literature
- US20060216417A1 System for control of gas injectors Public/Granted day:2006-09-28
Information query
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