Invention Grant
- Patent Title: Method and apparatus for the treatment of objects, in particular for the cleaning of semiconductor elements
- Patent Title (中): 用于处理物体的方法和装置，特别是用于清洁半导体元件
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Application No.: US11886208Application Date: 2006-03-15
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Publication No.: US08088227B2Publication Date: 2012-01-03
- Inventor: Norbert Bürger , Mirko Löhmann , Richard Herter
- Applicant: Norbert Bürger , Mirko Löhmann , Richard Herter
- Applicant Address: DE Gütenbach
- Assignee: RENA GmbH
- Current Assignee: RENA GmbH
- Current Assignee Address: DE Gütenbach
- Agency: Biotech Beach Law Group PC
- Priority: DE102005012244 20050315
- International Application: PCT/DE2006/000468 WO 20060315
- International Announcement: WO2006/097087 WO 20060921
- Main IPC: B08B3/12
- IPC: B08B3/12
Abstract:
The invention relates to the continuous cleaning of objects, in particular of semiconductor elements, using ultrasound, wherein the objects to be cleaned are arranged within a liquid. Furthermore, the present invention relates to an apparatus for carrying out the method according to the invention.A basic idea of the invention is that the surface of an object to be cleaned (2) in a tank (5) filled with liquid passes through at least one oscillation maximum that is emitted by at least one sound source (8a) being present in the tank (5). According to one embodiment, the sound source fields (8) that are positioned within the tank (5) are arranged inclined with respect to the transport direction (4).
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