Invention Grant
- Patent Title: Stabilized composition for producing chlorine dioxide
- Patent Title (中): 用于生产二氧化氯的稳定组合物
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Application No.: US11425561Application Date: 2006-06-21
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Publication No.: US08088300B2Publication Date: 2012-01-03
- Inventor: John Byrne , Barry Speronello
- Applicant: John Byrne , Barry Speronello
- Applicant Address: US NJ Florham Park
- Assignee: BASF Corporation
- Current Assignee: BASF Corporation
- Current Assignee Address: US NJ Florham Park
- Agent Bernard Lau
- Main IPC: C01B11/10
- IPC: C01B11/10 ; C01B11/02 ; C11D3/395

Abstract:
Disclosed is a stabilized chlorine dioxide generating composition containing an oxy-chlorine salt, an acid source, optionally a free halogen source, and an endothermic agent. The endothermic agent neutralizes heat evolved by exothermic reaction of the oxy-chlorine salt by the endothermic reaction of the endothermic agent. Since the endothermic reaction eliminates and/or mitigates propagation of the exothermic reaction of the oxy-chlorine salt from a localized area through the total mass of the material, the chlorine dioxide generating composition is thereby stabilized during making, storing, or shipping the composition.
Public/Granted literature
- US20070295936A1 STABILIZED COMPOSITION FOR PRODUCING CHLORINE DIOXIDE Public/Granted day:2007-12-27
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