Invention Grant
- Patent Title: Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom
- Patent Title (中): 含有萘环的具有卤素原子的光刻用底层涂料组合物
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Application No.: US11630891Application Date: 2005-06-24
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Publication No.: US08088546B2Publication Date: 2012-01-03
- Inventor: Satoshi Takei , Takahiro Sakaguchi , Tomoyuki Enomoto
- Applicant: Satoshi Takei , Takahiro Sakaguchi , Tomoyuki Enomoto
- Applicant Address: JP Tokyo
- Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-196955 20040702
- International Application: PCT/JP2005/011645 WO 20050624
- International Announcement: WO2006/003850 WO 20060112
- Main IPC: G03F7/004
- IPC: G03F7/004
Abstract:
There is provided an underlayer coating forming composition for lithography, and an underlayer coating having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, which are used in lithography process of manufacture of semiconductor device. Concretely, it is an underlayer coating forming composition comprising a polymer having a structural unit containing naphthalene ring substituted with halogen atom in a molar ratio of 0.3 or more in the structural units constituting the polymer, a solvent.
Public/Granted literature
- US20070238029A1 Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom Public/Granted day:2007-10-11
Information query
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