Invention Grant
- Patent Title: Exposure system and pattern formation method
- Patent Title (中): 曝光系统和图案形成方法
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Application No.: US12749289Application Date: 2010-03-29
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Publication No.: US08088565B2Publication Date: 2012-01-03
- Inventor: Masayuki Endo , Masaru Sasago
- Applicant: Masayuki Endo , Masaru Sasago
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2004-171592 20040609
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
An exposure system includes a cleaning unit for cleaning a surface of a resist film formed on a wafer with a cleaning fluid and an exposure unit for performing pattern exposure with an immersion liquid provided between the resist film and a projection lens.
Public/Granted literature
- US20100183988A1 EXPOSURE SYSTEM AND PATTERN FORMATION METHOD Public/Granted day:2010-07-22
Information query
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