Invention Grant
US08088566B2 Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
有权
用于图案形成的表面处理剂和使用表面处理剂的图案形成方法
- Patent Title: Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
- Patent Title (中): 用于图案形成的表面处理剂和使用表面处理剂的图案形成方法
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Application No.: US12053653Application Date: 2008-03-24
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Publication No.: US08088566B2Publication Date: 2012-01-03
- Inventor: Wataru Hoshino , Hideaki Tsubaki , Masahiro Yoshidome
- Applicant: Wataru Hoshino , Hideaki Tsubaki , Masahiro Yoshidome
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-079306 20070326; JP2007-311180 20071130
- Main IPC: G03F7/26
- IPC: G03F7/26 ; G03F7/004
Abstract:
A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.
Public/Granted literature
- US20080241742A1 SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT Public/Granted day:2008-10-02
Information query
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