Invention Grant
- Patent Title: Thin-filmed field effect transistor and making method
- Patent Title (中): 薄膜场效应晶体管及制作方法
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Application No.: US12350715Application Date: 2009-01-08
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Publication No.: US08088642B2Publication Date: 2012-01-03
- Inventor: Ikuo Fukui
- Applicant: Ikuo Fukui
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2003-304019 20030828
- Main IPC: H01L51/40
- IPC: H01L51/40

Abstract:
In a thin-film field effect transistor with a MIS structure, the materials of which the semiconductor and insulating layers are made are polymers which are dissolvable in organic solvents and have a weight average molecular weight of more than 2,000 to 1,000,000. Use of polymers for both the semiconductor layer and insulating layer of TFT eliminates such treatments as patterning and etching using photoresists in the prior art circuit-forming technology, reduces the probability of TFT defects and achieves a reduction of TFT manufacture cost.
Public/Granted literature
- US20090124051A1 THIN-FILMED FIELD EFFECT TRANSISTOR AND MAKING METHOD Public/Granted day:2009-05-14
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