Invention Grant
US08088661B2 Nonvolatile semiconductor memory with resistance elements and method of manufacturing the same
失效
具有电阻元件的非易失性半导体存储器及其制造方法
- Patent Title: Nonvolatile semiconductor memory with resistance elements and method of manufacturing the same
- Patent Title (中): 具有电阻元件的非易失性半导体存储器及其制造方法
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Application No.: US12652548Application Date: 2010-01-05
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Publication No.: US08088661B2Publication Date: 2012-01-03
- Inventor: Fumitaka Arai , Atsuhiro Sato
- Applicant: Fumitaka Arai , Atsuhiro Sato
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-244557 20060908
- Main IPC: H01L29/72
- IPC: H01L29/72

Abstract:
A nonvolatile semiconductor memory of an aspect of the present invention comprises a memory cell transistor and a resistance element arranged on a semiconductor substrate. The memory cell transistor includes a floating gate electrode constituted of a first conductive material arranged on a gate insulating film on a surface of the semiconductor substrate, an inter-gate insulating film arranged on the floating gate electrode, a control gate electrode arranged on the inter-gate insulating film, and a source/drain diffusion layer provided in the semiconductor substrate. The resistance element includes an element isolation insulating layer arranged in the semiconductor substrate and including a depression, and a resistor constituted of a second conductive material filling up the depression. An impurity concentration of the second conductive material is lower than that of the first conductive material.
Public/Granted literature
- US20100105177A1 NONVOLATILE SEMICONDUCTOR MEMORY WITH RESISTANCE ELEMENTS AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-04-29
Information query
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