Invention Grant
- Patent Title: (Meth)acrylate, polymer and resist composition
- Patent Title (中): （甲基）丙烯酸酯，聚合物和抗蚀剂组合物
-
Application No.: US11596865Application Date: 2005-05-17
-
Publication No.: US08088875B2Publication Date: 2012-01-03
- Inventor: Atsushi Ootake , Tadashi Nakamura
- Applicant: Atsushi Ootake , Tadashi Nakamura
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Rayon Co., Ltd.
- Current Assignee: Mitsubishi Rayon Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPP2004-150822 20040520; JPP2004-320606 20041104
- International Application: PCT/JP2005/008955 WO 20050517
- International Announcement: WO2005/113617 WO 20051201
- Main IPC: C08F20/18
- IPC: C08F20/18 ; C08F20/68 ; G03F7/004 ; G03F7/039
Abstract:
A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.
Public/Granted literature
- US20080003529A1 (Meth)Acrylate, Polymer and Resist Composition Public/Granted day:2008-01-03
Information query
IPC分类:
